Fully integrated CMOS-compatible photodetector with color selectivity and intrinsic gain
AuthorZheng, Bob Yi; Wang, Yumin; Halas, Nancy J.; Nordlander, Peter
A metal-semiconductor-metal photodetecting device and method of manufacturing a metal-semiconductor-metal photodetecting device that includes a p-type silicon substrate with an oxide layer disposed on the p-type silicon substrate. Schotty junctions are disposed adjacent to the oxide layer on the p-type silicon substrate and a plasmonic grating disposed on the oxide layer. The plasmonic grating provides wavelength range selectability for the photodetecting device.
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