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    Surface-initiated growth of copper using isonicotinic acid-functionalized aluminum oxide surfaces

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    Author
    Gowenlock, Cathren E.; Gomez, Virginia; McGettrick, James D.; Andreoli, Enrico; Barron, Andrew R.
    Date
    2016
    Abstract
    Isonicotinate self-assembled monolayers (SAM) were prepared on alumina surfaces (A) using isonicotinic acid (iNA). These functionalized layers (iNA-A) were used for the seeded growth of copper films (Cu-iNA-A) by hydrazine hydrate-initiated electroless deposition. The films were characterized by scanning electron microscopy (SEM), electron-dispersive X-ray spectroscopy, atomic force microscopy, X-ray photoelectron spectroscopy, X-ray diffraction, and advancing contact angle measurements. The films are Cu0 but with surface oxidation, and show a faceted morphology, which is more textured (Rq = 460 ± 90 nm) compared to the SAM (Rq = 2.8 ± 0.5 nm). In contrast, growth of copper films by SnCl2/PdCl2 catalyzed electroless deposition, using formaldehyde (CH2O) as the reducing agent, shows a nodular morphology on top of a relatively smooth surface. No copper films are observed in the absence of the isonicotinate SAM. The binding of Cu2+ to the iNA is proposed to facilitate reduction to Cu0 and create the seed for subsequent growth. The films show good adhesion to the functionalized surface.
    Citation
    Gowenlock, Cathren E., Gomez, Virginia, McGettrick, James D., et al.. "Surface-initiated growth of copper using isonicotinic acid-functionalized aluminum oxide surfaces." Journal of Coatings Technology and Research, (2016) Springer: http://dx.doi.org/10.1007/s11998-016-9842-0.
    Published Version
    http://dx.doi.org/10.1007/s11998-016-9842-0
    Keyword
    copper; isonicotinic acid; aluminum oxide; thin film; electroless deposition
    Type
    Journal article
    Publisher
    Springer
    Citable link to this page
    https://hdl.handle.net/1911/92718
    Rights
    This article is distributed under the terms of the Creative Commons Attribution 4.0 International License, which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made.
    Link to License
    https://creativecommons.org/licenses/by/4.0/
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    • Chemistry Publications [636]
    • Faculty Publications [4988]
    • Materials Science and NanoEngineering Publications [352]

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    Managed by the Digital Scholarship Services at Fondren Library, Rice University
    Physical Address: 6100 Main Street, Houston, Texas 77005
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    Site Map