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  • Submicron Optical Lithography Based on a New Interferometric Phase Shifting Technique 

    Kido, Motoi; Szabo, Gabor; Cavallaro, Joseph R.; Wilson, William L.; Smayling, Michael C.; Tittel, Frank K. (1995-08-01)
    This paper reports the computer simulation and experimental demonstration of a new phase shifting technique based on interferometry that is especially suited for deep ultraviolet (UV) microlithography. Significant resolution ...