Now showing items 1-22 of 22

  • Automated Evaluation of Critical Features in VLSI Layouts Based on Photolithographic Simulations 

    Cavallaro, Joseph R.; Sengupta, Chaitali; Tittel, Frank K.; Wilson, William L. Jr. (SME Press, 1996-01-01)
    This paper describes a CAD tool (An Integrated CAD Framework) which links VLSI layout editors to lithographic simulators and provides information on the simulated resolution of a feature to the circuit designer. The designer ...
  • Automated Evaluation of Critical Features in VLSI Layouts Based on Photolithographic Simulations 

    Sengupta, Chaitali; Cavallaro, Joseph R.; Wilson, William L.; Tittel, Frank K. (IEEE, 1997-11-01)
    In this paper, we address the problem of identifying and evaluating “critical features” in an integrated circuit (IC) layout. The “critical features” (e.g., nested elbows and open ends) are areas in the layout that are ...
  • Characterization of Iron Doped Lithium Niobate for Holographic Storage Applications 

    Shah, Rajiv R.; Kim, Dae M.; Rabson, Thomas A.; Tittel, Frank K. (1976-06-20)
    A detailed study of eight systematically chosen Fe:LiNb0<sub>3</sub> crystals is presented. Correlation between the photorefractive sensitivity and various chemical properties of Fe:LiNb0<sub>3</sub> is investigated in ...
  • Computer Controlled Intracavity Frequency Doubling of a CW Dye Ring Laser 

    Marshall, Charles M.; Pollock, Clifford R.; Stickel, Robert E.; Tittel, Frank K. (1979-10-20)
    The development of a computer controlled tunable ultraviolet spectrometer utilizing intracavity second harmonic generation in a single frequency CW dye ring laser is reported. With 5 W of argon ion laser pump power at 514.5 ...
  • Development of Digital Signal Processor controlled Quantum Cascade Laser based Trace Gas Sensor Technology 

    So, Stephen; Wysocki, Gerard; Frantz, Patrick; Tittel, Frank K. (2006-08-01)
    This work reports the design and integration of a custom digital signal processor (DSP) system into a pulsed quantum cascade laser (QCL) based trace gas sensor to improve its portability, robustness and operating performance. ...
  • Enhanced Microlithography Using Combined Phase Shifting and Off-axis Illumination 

    Erdelyi, Miklos; Bor, Zsolt; Cavallaro, Joseph R.; Szabo, Gabor; Wilson, William L.; Sengupta, Chaitali; Smayling, Michael C.; Tittel, Frank K. (Japanese Journal of Applied Physics, 1995-12-01)
    Off-axis illumination is a promising optical microlithography technique which can be used to improve the image quality of line-space patterns. With this method the image is produced by the zero and first order diffracted ...
  • Enhanced VLSI Manufacturability Using an Integrated CAD Framework 

    Fossati, Humberto M.; Tittel, Frank K.; Wilson, William L.; Cavallaro, Joseph R. (SME Press, 1994-01-01)
    Continued improvements in VLSI performance, circuit density and production costs are possible, in part, do to significant advances in lithography. As feature sizes get smaller, design houses are faced with either improving ...
  • Generation of diffraction-free beams for applications in optical microlithography 

    Erdelyi, Miklos; Horvath, Zoltan L.; Szabo, Gabor; Bor, Zs.; Tittel, Frank K.; Cavallaro, Joseph R.; Smayling, Michael C. (American Vacuum Society, 1997-03-01)
    A new concept based on a Fabry–Perot interferometer for the generation of nondiffracting Bessel beams is described and proposed for potential applications in microlithography such as the fabrication of small isolated ...
  • Generation of nearly nondiffracting Bessel beams with a Fabry–Perot interferometer 

    Horvath, Zoltan L.; Erdelyi, Miklos; Szabo, Gabor; Bor, Zs.; Tittel, Frank K.; Cavallaro, Joseph R. (Optical Society of America, 1997-11-01)
    A new concept for generating zero-order Bessel beams was studied theoretically. The spatial intensity distribution was calculated numerically using a wave optics model. Approximate analytical expressions were derived to ...
  • An Integrated CAD Framework Linking VLSI Layout Editors and Process Simulators 

    Sengupta, Chaitali; Erdelyi, Miklos; Bor, Zsolt; Cavallaro, Joseph R.; Smayling, Michael C.; Szabo, Gabor; Tittel, Frank K.; Wilson, William L. (SPIE, 1996-03-01)
    As feature sizes in VLSI circuits extend into the far sub-micron range, new process techniques, such as using phase shifting masks for photolithography, will be needed. Under these conditions, the only means for the circuit ...
  • Interferometric Phase Shift Technique for High Resolution Deep UV Microlithography 

    Tittel, Frank K.; Cavallaro, Joseph R.; Kido, Motoi; Smayling, Michael C.; Szabo, Gabor; Wilson, William L. (SPIE, 1994-09-01)
    A new phase shifting technique based on interferometry has been developed which is especially suited for deep-UV microlithography. Using only a single layer chromium mask, with no additional phase shift elements, significant ...
  • A New Interferometric Phase-Shifting Technique for Sub-half-micron Laser Microlithography 

    Erdelyi, Miklos; Sengupta, Chaitali; Bor, Zsolt; Cavallaro, Joseph R.; Kido, Motoi; Smayling, Michael C.; Tittel, Frank K.; Wilson, William L.; Szabo, Gabor (SPIE, 1995-02-01)
    This paper reports recent progress in achieving sub-half-micron feature sizes with UV laser illumination based on a novel interferometric phase shifting (IPS) technique. In the IPS arrangement, the intensity and amount of ...
  • A New Phase Shifting Method for High Resolution Microlithography 

    Kido, Motoi; Cavallaro, Joseph R.; Szabo, Gabor; Wilson, William L.; Tittel, Frank K. (SME Press, 1994-01-01)
    One of the most promising lithographic technique for the future designs of DRAMs is the phase-shifting mask technique. Conventional phase shifting-masks, however, are difficult to fabricate as they require regions of ...
  • Nonlinear Dynamic Theory for Photorefractive Phase Hologram Formation 

    Kim, Dae M.; Shah, Rajiv R.; Rabson, Thomas A.; Tittel, Frank K. (1976-01-20)
    A nonlinar dynamic theory is developed for the formation of photorefractive volume phase holograms. A feedback mechanism existing between the photo-generated field and free electron density, treated explicitly yields the ...
  • QEPAS based ppb-level detection of CO and N2O using a high power CW DFB-QCL 

    Ma, Yufei; Lewicki, Rafał; Razeghi, Manijeh; Tittel, Frank K. (Optical Society of America, 2013-01-14)
    An ultra-sensitive and selective quartz-enhanced photoacoustic spectroscopy (QEPAS) sensor platform was demonstrated for detection of carbon monoxide (CO) and nitrous oxide (N2O). This sensor used a stateof- the art ...
  • Quantum Cascade Laser Spectrometer for Trace-Gas Detection of Exhaled Carbonyl Sulfide 

    Wysocki, Gerard; So, Stephen; McCurdy, Matthew; Roller, Chad; Weidman, Daniel; Frantz, Patrick; Curl, Robert; Tittel, Frank K. (2004-05-01)
    Simultaneous concentration measurements of echaled carbonyl sulfide and carbon dioxide were demonstrated using a pulsed quantum cascade laser based gas sensor. This sensor has potential applications in biomedical diagnostics ...
  • Quartz-Enhanced Photoacoustic Spectroscopy: A Review 

    Patimisco, Pietro; Scamarcio, Gaetano; Tittel, Frank K.; Spagnolo, Vincenzo (2014)
    A detailed review on the development of quartz-enhanced photoacoustic sensors (QEPAS) for the sensitive and selective quantification of molecular trace gas species with resolved spectroscopic features is reported. The basis ...
  • Study of the Equivalent Electron Drift Field Characteristics in LiNb0<sub>3</sub> by Phase Holography 

    Kim, Dae M.; Shah, Rajiv R.; Rabson, Thomas A.; Tittel, Frank K. (1976-06-20)
    An analysis of the diffraction efficiency of photorefractive holograms in ferroelectric crystals is shown to provide a novel technique for determining the nature and magnitude of the equivalent electron drift field. For ...
  • Sub-quarter micron contact hole fabrication using annular illumination 

    Erdelyi, Miklos; Bor, Zsolt; Szabo, Gabor; Cavallaro, Joseph R.; Smayling, Michael C.; Tittel, Frank K.; Wilson, William L. (SPIE, 1996-03-01)
    Details of an experimental demonstration of a contact hole imaging system are reported in which the depth of focus is increased by a factor of about 3.5 using annular illumination. Due to spatial filtering and nonlinearity ...
  • Submicron Optical Lithography Based on a New Interferometric Phase Shifting Technique 

    Kido, Motoi; Szabo, Gabor; Cavallaro, Joseph R.; Wilson, William L.; Smayling, Michael C.; Tittel, Frank K. (Japanese Journal of Applied Physics, 1995-08-01)
    This paper reports the computer simulation and experimental demonstration of a new phase shifting technique based on interferometry that is especially suited for deep ultraviolet (UV) microlithography. Significant resolution ...
  • Submicron Optical Lithography Based on Interferometric Phase Shifting 

    Cavallaro, Joseph R.; Tittel, Frank K.; Wilson, William L. Jr. (SME Press, 1995-01-01)
    One of the most critical processing steps in the fabrication of integrated circuits is microlithography. The design of high density DRAMs requires the accurate patterning of submicron structures. The manufacturability of ...
  • Ultrahigh Resolution Lithography with Excimer Lasers 

    Tittel, Frank K.; Erdelyi, Miklos; Sengupta, Chaitali; Bor, Zsolt; Szabo, Gabor; Cavallaro, Joseph R.; Smayling, Michael C.; Wilson, William L. (Kluwer Academic Publishers, 1995-07-01)
    The photolithography process is central to integrated circuit fabrication. Through this process an integrated circuit is patterned by imaging a photomask onto a layer of photoresist. The light source currently being used ...