Now showing items 1-20 of 34

    • Analysis of overtone flexural modes operation in quartz-enhanced photoacoustic spectroscopy 

      Tittel, Frank K.; Sampaolo, Angelo; Patimisco, Pietro; Dong, Lei; Geras, Antonina; Starecki, Tomasz; Spagnolo, Vincenzo (2016)
      A detailed investigation of a set of custom quartz tuning forks (QTFs), operating in the fundamental and first overtone flexural modes is reported. Support losses are the dominant energy dissipation processes when the QTFs ...
    • Automated Evaluation of Critical Features in VLSI Layouts Based on Photolithographic Simulations 

      Cavallaro, Joseph R.; Sengupta, Chaitali; Tittel, Frank K.; Wilson, William L. Jr. (1996-01-01)
      This paper describes a CAD tool (An Integrated CAD Framework) which links VLSI layout editors to lithographic simulators and provides information on the simulated resolution of a feature to the circuit designer. The designer ...
    • Automated Evaluation of Critical Features in VLSI Layouts Based on Photolithographic Simulations 

      Sengupta, Chaitali; Cavallaro, Joseph R.; Wilson, William L.; Tittel, Frank K. (1997-11-01)
      In this paper, we address the problem of identifying and evaluating “critical features” in an integrated circuit (IC) layout. The “critical features” (e.g., nested elbows and open ends) are areas in the layout that are ...
    • Characterization of Iron Doped Lithium Niobate for Holographic Storage Applications 

      Shah, Rajiv R.; Kim, Dae M.; Rabson, Thomas A.; Tittel, Frank K. (1976-06-20)
      A detailed study of eight systematically chosen Fe:LiNb0<sub>3</sub> crystals is presented. Correlation between the photorefractive sensitivity and various chemical properties of Fe:LiNb0<sub>3</sub> is investigated in ...
    • Compact TDLAS based sensor design using interband cascade lasers for mid-IR trace gas sensing 

      Dong, Lei; Tittel, Frank K.; Li, Chunguang; Sanchez, Nancy P.; Wu, Hongpeng; Zheng, Chuantao; Yu, Yajun; Sampaolo, Angelo; Griffin, Robert J. (2016)
      Two compact TDLAS sensor systems based on different structural optical cores were developed. The two optical cores combine two recent developments, gallium antimonide (GaSb)-based ICL and a compact multipass gas cell (MPGC) ...
    • Computer Controlled Intracavity Frequency Doubling of a CW Dye Ring Laser 

      Marshall, Charles M.; Pollock, Clifford R.; Stickel, Robert E.; Tittel, Frank K. (1979-10-20)
      The development of a computer controlled tunable ultraviolet spectrometer utilizing intracavity second harmonic generation in a single frequency CW dye ring laser is reported. With 5 W of argon ion laser pump power at 514.5 ...
    • CW EC-QCL-based sensor for simultaneous detection of H2O, HDO, N2O and CH4ᅠusing multi-pass absorption spectroscopy 

      Yu, Yajun; Sanchez, Nancy P.; Griffin, Robert J.; Tittel, Frank K. (2016)
      A sensor system based on a continuous wave, external-cavity quantum-cascade laser (CW EC-QCL) was demonstrated for simultaneous detection of atmospheric H2O, HDO, N2O and CH4using a compact, dense pattern multi-pass gas ...
    • Development of Digital Signal Processor controlled Quantum Cascade Laser based Trace Gas Sensor Technology 

      So, Stephen; Wysocki, Gerard; Frantz, Patrick; Tittel, Frank K. (2006-08-01)
      This work reports the design and integration of a custom digital signal processor (DSP) system into a pulsed quantum cascade laser (QCL) based trace gas sensor to improve its portability, robustness and operating performance. ...
    • Enhanced Microlithography Using Combined Phase Shifting and Off-axis Illumination 

      Erdelyi, Miklos; Bor, Zsolt; Cavallaro, Joseph R.; Szabo, Gabor; Wilson, William L.; Sengupta, Chaitali; Smayling, Michael C.; Tittel, Frank K. (1995-12-01)
      Off-axis illumination is a promising optical microlithography technique which can be used to improve the image quality of line-space patterns. With this method the image is produced by the zero and first order diffracted ...
    • Enhanced VLSI Manufacturability Using an Integrated CAD Framework 

      Fossati, Humberto M.; Tittel, Frank K.; Wilson, William L.; Cavallaro, Joseph R. (1994-01-01)
      Continued improvements in VLSI performance, circuit density and production costs are possible, in part, do to significant advances in lithography. As feature sizes get smaller, design houses are faced with either improving ...
    • Generation of diffraction-free beams for applications in optical microlithography 

      Erdelyi, Miklos; Horvath, Zoltan L.; Szabo, Gabor; Bor, Zs.; Tittel, Frank K.; Cavallaro, Joseph R.; Smayling, Michael C. (1997-03-01)
      A new concept based on a Fabry–Perot interferometer for the generation of nondiffracting Bessel beams is described and proposed for potential applications in microlithography such as the fabrication of small isolated ...
    • Generation of nearly nondiffracting Bessel beams with a Fabry–Perot interferometer 

      Horvath, Zoltan L.; Erdelyi, Miklos; Szabo, Gabor; Bor, Zs.; Tittel, Frank K.; Cavallaro, Joseph R. (1997-11-01)
      A new concept for generating zero-order Bessel beams was studied theoretically. The spatial intensity distribution was calculated numerically using a wave optics model. Approximate analytical expressions were derived to ...
    • Improved Tuning Fork for Terahertz Quartz-Enhanced Photoacoustic Spectroscopy 

      Sampaolo, Angelo; Patimisco, Pietro; Giglio, Marilena; Vitiello, Miriam S.; Beere, Harvey E.; Ritchie, David A.; Scamarcio, Gaetano; Tittel, Frank K.; Spagnolo, Vincenzo (2016)
      We report on a quartz-enhanced photoacoustic (QEPAS) sensor for methanol (CH₃OH) detection employing a novel quartz tuning fork (QTF), specifically designed to enhance the QEPAS sensing performance in the terahertz (THz) ...
    • An Integrated CAD Framework Linking VLSI Layout Editors and Process Simulators 

      Sengupta, Chaitali; Erdelyi, Miklos; Bor, Zsolt; Cavallaro, Joseph R.; Smayling, Michael C.; Szabo, Gabor; Tittel, Frank K.; Wilson, William L. (1996-03-01)
      As feature sizes in VLSI circuits extend into the far sub-micron range, new process techniques, such as using phase shifting masks for photolithography, will be needed. Under these conditions, the only means for the circuit ...
    • Interferometric Phase Shift Technique for High Resolution Deep UV Microlithography 

      Tittel, Frank K.; Cavallaro, Joseph R.; Kido, Motoi; Smayling, Michael C.; Szabo, Gabor; Wilson, William L. (1994-09-01)
      A new phase shifting technique based on interferometry has been developed which is especially suited for deep-UV microlithography. Using only a single layer chromium mask, with no additional phase shift elements, significant ...
    • Low-Loss Coupling of Quantum Cascade Lasers into Hollow-Core Waveguides with Single-Mode Output in the 3.7–7.6 μm Spectral Range 

      Patimisco, Pietro; Sampaolo, Angelo; Mihai, Laura; Giglio, Marilena; Kriesel, Jason; Sporea, Dan; Scamarcio, Gaetano; Tittel, Frank K.; Spagnolo, Vincenzo (2016)
      We demonstrated low-loss and single-mode laser beam delivery through hollow-core waveguides (HCWs) operating in the 3.7–7.6 μm spectral range. The employed HCWs have a circular cross section with a bore diameter of 200 μm ...
    • New approaches in quartz-enhanced photoacoustic sensing 

      Sampaolo, Angelo; Patimisco, Pietro; Pennetta, Riccardo; Scamarcio, Gaetano; Tittel, Frank K. (2015)
      We report on the design and realization of custom quartz tuning forks with different geometries and sizes aimed to improve the photoacoustic effect in quartz-enhanced photoacoustic (QEPAS) sensor systems. A detailed analysis ...
    • A New Interferometric Phase-Shifting Technique for Sub-half-micron Laser Microlithography 

      Erdelyi, Miklos; Sengupta, Chaitali; Bor, Zsolt; Cavallaro, Joseph R.; Kido, Motoi; Smayling, Michael C.; Tittel, Frank K.; Wilson, William L.; Szabo, Gabor (1995-02-01)
      This paper reports recent progress in achieving sub-half-micron feature sizes with UV laser illumination based on a novel interferometric phase shifting (IPS) technique. In the IPS arrangement, the intensity and amount of ...
    • A New Phase Shifting Method for High Resolution Microlithography 

      Kido, Motoi; Cavallaro, Joseph R.; Szabo, Gabor; Wilson, William L.; Tittel, Frank K. (1994-01-01)
      One of the most promising lithographic technique for the future designs of DRAMs is the phase-shifting mask technique. Conventional phase shifting-masks, however, are difficult to fabricate as they require regions of ...
    • Nonlinear Dynamic Theory for Photorefractive Phase Hologram Formation 

      Kim, Dae M.; Shah, Rajiv R.; Rabson, Thomas A.; Tittel, Frank K. (1976-01-20)
      A nonlinar dynamic theory is developed for the formation of photorefractive volume phase holograms. A feedback mechanism existing between the photo-generated field and free electron density, treated explicitly yields the ...