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  • Generation of diffraction-free beams for applications in optical microlithography 

    Erdelyi, Miklos; Horvath, Zoltan L.; Szabo, Gabor; Bor, Zs.; Tittel, Frank K.; Cavallaro, Joseph R.; Smayling, Michael C. (1997-03-01)
    A new concept based on a Fabry–Perot interferometer for the generation of nondiffracting Bessel beams is described and proposed for potential applications in microlithography such as the fabrication of small isolated ...