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    Second harmonic microscopy of monolayer MoS2

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    Author
    Kumar, Nardeep; Najmaei, Sina; Cui, Qiannan; Ceballos, Frank; Ajayan, Pulickel M.; More... Lou, Jun; Zhao, Hui Less...
    Date
    2013
    Abstract
    We show that the lack of inversion symmetry in monolayer MoS2 allows strong optical second harmonic generation. The second harmonic of an 810-nm pulse is generated in a mechanically exfoliated monolayer, with a nonlinear susceptibility on the order of 10−7 m/V. The susceptibility reduces by a factor of seven in trilayers, and by about two orders ofmagnitude in even layers. A proof-of-principle second harmonicmicroscopymeasurement is performed on samples grown by chemical vapor deposition, which illustrates potential applications of this effect in the fast and noninvasive detection of crystalline orientation, thickness uniformity, layer stacking, and single-crystal domain size of atomically thin films of MoS2 and similar materials.
    Citation
    Kumar, Nardeep, Najmaei, Sina, Cui, Qiannan, et al.. "Second harmonic microscopy of monolayer MoS2." Physical Review B, 87, (2013) American Physical Society: 161403(R). http://dx.doi.org/10.1103/PhysRevB.87.161403.
    Published Version
    http://dx.doi.org/10.1103/PhysRevB.87.161403
    Type
    Journal article
    Publisher
    American Physical Society
    Citable link to this page
    https://hdl.handle.net/1911/70968
    Rights
    Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
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    • Faculty Publications [4988]
    • Mechanical Engineering Publications [151]

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    Home | FAQ | Contact Us | Privacy Notice | Accessibility Statement
    Managed by the Digital Scholarship Services at Fondren Library, Rice University
    Physical Address: 6100 Main Street, Houston, Texas 77005
    Mailing Address: MS-44, P.O.BOX 1892, Houston, Texas 77251-1892
    Site Map