|dc.contributor.author||Singer, Jonathan P.
Kooi, Steven E.
Thomas, Edwin L.
Singer, Jonathan P., Lee, Jae-Hwang, Kooi, Steven E., et al.. "Rapid fabrication of 3D terahertz split ring resonator arrays by novel single-shot direct write focused proximity field nanopatterning." Optics Express, 20, no. 10 (2012) Optical Society of America: http://dx.doi.org/10.1364/OE.20.011097.
For the next generation of phoXonic, plasmonic, optomechanical
and microfluidic devices, the capability to create 3D
microstructures is highly desirable. Fabrication of such structures by
conventional top-down techniques generally requires multiple timeconsuming
steps and is limited in the ability to define features spanning
multiple layers at prescribed angles. 3D direct write lithography (3DDW)
has the capability to draw nearly arbitrary structures, but is an inherently
slow serial writing process. Here we present a method, denoted focused
proximity field nanopatterning (FPnP), that combines 3DDW with single or
multiphoton interference lithography (IL). By exposing a thick photoresist
layer having a phase mask pattern imprinted on its surface with a tightly
focused laser beam, we produce locally unique complex structures. The
morphology can be varied based on beam and mask parameters. Patterns
may be written rapidly in a single shot mode with arbitrary positions
defined by the direct write, thus exploiting the control of 3DDW with the
enhanced speed of phase mask IL. Here we show the ability for this
technique to rapidly produce arrays of “stand-up” far IR resonators.
Optical Society of America
Rapid fabrication of 3D terahertz split ring resonator arrays by novel single-shot direct write focused proximity field nanopatterning
|dc.subject.keyword||laser materials processing