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dc.contributor.authorKido, Motoi
Cavallaro, Joseph R.
Szabo, Gabor
Wilson, William L.
Tittel, Frank K. 2012-06-21T20:31:42Z 2012-06-21T20:31:42Z 1994-01-01
dc.identifier.citation M. Kido, J. R. Cavallaro, G. Szabo, W. L. Wilson and F. K. Tittel, "A New Phase Shifting Method for High Resolution Microlithography," 1994.
dc.description.abstract One of the most promising lithographic technique for the future designs of DRAMs is the phase-shifting mask technique. Conventional phase shifting-masks, however, are difficult to fabricate as they require regions of different optical thickness. We present a new phase shifting technique that does not use any phase shifting materials. A special interferometer and a mask that has both transmitting areas and reflective areas accomplish the required phase-shift at the image plane. Using this technique we have demonstrated phase shifting effects using a CCD camera. We also present the results of a computer simulation for the critical resolution of this new method in comparison with the conventional phase shifting approach.
dc.description.sponsorship National Science Foundation
dc.language.iso eng
dc.publisher SME Press
dc.subjectPhase shifting technique
Critical resolution
dc.title A New Phase Shifting Method for High Resolution Microlithography
dc.type Conference paper Center for Multimedia Communication
dc.citation.location Cambridge, MA
dc.citation.conferenceName NSF Design and Manufacturing Grantees Conference
dc.citation.conferenceDate 1994
dc.type.dcmi Text
dc.type.dcmi Text
dc.citation.firstpage 577
dc.citation.lastpage 578

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  • CMC Publications [268]
    Publications by Rice Faculty and graduate students in multimedia communications
  • ECE Publications [1278]
    Publications by Rice University Electrical and Computer Engineering faculty and graduate students

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