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    A New Phase Shifting Method for High Resolution Microlithography

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    Author
    Kido, Motoi
    Cavallaro, Joseph R.
    Szabo, Gabor
    Wilson, William L.
    Tittel, Frank K.
    Type
    Conference paper
    Publisher
    SME Press
    Citation
    M. Kido, J. R. Cavallaro, G. Szabo, W. L. Wilson and F. K. Tittel, "A New Phase Shifting Method for High Resolution Microlithography," 1994.
    Abstract
    One of the most promising lithographic technique for the future designs of DRAMs is the phase-shifting mask technique. Conventional phase shifting-masks, however, are difficult to fabricate as they require regions of different optical thickness. We present a new phase shifting technique that does not use any phase shifting materials. A special interferometer and a mask that has both transmitting areas and reflective areas accomplish the required phase-shift at the image plane. Using this technique we have demonstrated phase shifting effects using a CCD camera. We also present the results of a computer simulation for the critical resolution of this new method in comparison with the conventional phase shifting approach.
    Date
    1994-01-01
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    • ECE Publications [1278]

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    Managed by the Digital Scholarship Services at Fondren Library, Rice University
    Physical Address: 6100 Main Street, Houston, Texas 77005
    Mailing Address: MS-44, P.O.BOX 1892, Houston, Texas 77251-1892