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dc.contributor.authorSengupta, Chaitali
Erdelyi, Miklos
Bor, Zsolt
Cavallaro, Joseph R.
Smayling, Michael C.
Szabo, Gabor
Tittel, Frank K.
Wilson, William L.
dc.date.accessioned 2012-06-15T21:52:21Z
dc.date.available 2012-06-15T21:52:21Z
dc.date.issued 1996-03-01
dc.identifier.citation C. Sengupta, M. Erdelyi, Z. Bor, J. R. Cavallaro, M. C. Smayling, G. Szabo, F. K. Tittel and W. L. Wilson, "An Integrated CAD Framework Linking VLSI Layout Editors and Process Simulators," 1996.
dc.identifier.urihttps://hdl.handle.net/1911/64279
dc.description.abstract As feature sizes in VLSI circuits extend into the far sub-micron range, new process techniques, such as using phase shifting masks for photolithography, will be needed. Under these conditions, the only means for the circuit designer to design compact and efficient circuits with good yield capabilities is to be able to see t he effect of different design approaches on manufactured silicon, instead of solely relying on conservative general design rules. The Integrated CAD Framework accomplishes this by providing a link between a layout editor (Magic), advanced photolithographic techniques such as phase shifted masks, and a process simulator (Depict). This paper discusses some applications of this tool. A non-conventional process technique involving interferometric phase shifting and off-axis illumination has been evaluated using the tool. Also, a feature of the CAD Framework which allows representation of a phase shifted mask, together with its layout analysis capability has been used to compact a piece of layout by inserting phase shifted elements into it.
dc.description.sponsorship National Science Foundation
dc.language.iso eng
dc.publisher SPIE
dc.subjectPhotolithographic simulations
Critical features
CAD framework
dc.title An Integrated CAD Framework Linking VLSI Layout Editors and Process Simulators
dc.type Conference paper
dc.contributor.org Center for Multimedia Communication
dc.citation.location Santa Clara, CA
dc.citation.conferenceName SPIE Conference on Optical Microlithography IX
dc.citation.conferenceDate 1996
dc.type.dcmi Text
dc.type.dcmi Text
dc.identifier.doihttp://dx.doi.org/10.1117/12.240955
dc.citation.firstpage 244
dc.citation.lastpage 252


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  • CMC Publications [268]
    Publications by Rice Faculty and graduate students in multimedia communications
  • ECE Publications [1278]
    Publications by Rice University Electrical and Computer Engineering faculty and graduate students

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