Show simple item record

dc.contributor.authorErdelyi, Miklos
Bor, Zsolt
Cavallaro, Joseph R.
Szabo, Gabor
Wilson, William L.
Sengupta, Chaitali
Smayling, Michael C.
Tittel, Frank K.
dc.date.accessioned 2012-05-30T15:58:20Z
dc.date.available 2012-05-30T15:58:20Z
dc.date.issued 1995-12-01
dc.identifier.citation M. Erdelyi, Z. Bor, J. R. Cavallaro, G. Szabo, W. L. Wilson, C. Sengupta, M. C. Smayling and F. K. Tittel, "Enhanced Microlithography Using Combined Phase Shifting and Off-axis Illumination," Japanese Journal of Applied Physics, vol. 34, no. 12A, 1995.
dc.identifier.issn10.1143/JJAP.34.L1629
dc.identifier.otherhttp://scholar.google.com/scholar?cluster=10537488675807051316&hl=en&as_sdt=0,44
dc.identifier.urihttps://hdl.handle.net/1911/64193
dc.description.abstract Off-axis illumination is a promising optical microlithography technique which can be used to improve the image quality of line-space patterns. With this method the image is produced by the zero and first order diffracted beams. Due to the intensity difference between these two order diffracted beams the contrast of the image cannot be unity. This paper demonstrates the optical enhancement that can be achieved by a combination of interferometric phase shifting and off-axis illumination. In such an arrangement the mask is illuminated symmetrically from both the front and back sides, and not two but in fact four–(two zero and two first)–order beams produce the image. We show experimentally that the contrast of the image can be improved if the phase difference between the reflected and transmitted beams is π, and the intensity of the transmitted beam is about 13% of the reflected beam. This improved quality image with feature sizes of 0.4 µm was recorded in a photoresist using an Ar+ ion laser operating at 457.9 nm.
dc.description.sponsorship National Science Foundation
dc.description.sponsorship OTKA Foundation of the Hungarian Academy of Sciences
dc.language.iso eng
dc.publisher Japanese Journal of Applied Physics
dc.subjectPhase shifting technique
Submicron microlithography
Off-axis illumination
Interference
dc.title Enhanced Microlithography Using Combined Phase Shifting and Off-axis Illumination
dc.type Journal article
dc.citation.journalTitle Japanese Journal of Applied Physics
dc.contributor.org Center for Multimedia Communication
dc.citation.volumeNumber 34
dc.citation.issueNumber 12A
dc.type.dcmi Text
dc.type.dcmi Text
dc.identifier.doihttp://dx.doi.org/10.1143/JJAP.34.L1629
dc.citation.firstpage L1629
dc.citation.lastpage L1631


Files in this item

Thumbnail

This item appears in the following Collection(s)

  • CMC Publications [268]
    Publications by Rice Faculty and graduate students in multimedia communications
  • ECE Publications [1294]
    Publications by Rice University Electrical and Computer Engineering faculty and graduate students

Show simple item record