Now showing items 1-10 of 10

  • Automated Evaluation of Critical Features in VLSI Layouts Based on Photolithographic Simulations 

    Sengupta, Chaitali; Cavallaro, Joseph R.; Wilson, William L.; Tittel, Frank K. (1997-11-01)
    In this paper, we address the problem of identifying and evaluating “critical features” in an integrated circuit (IC) layout. The “critical features” (e.g., nested elbows and open ends) are areas in the layout that are ...
  • Sub-quarter micron contact hole fabrication using annular illumination 

    Erdelyi, Miklos; Bor, Zsolt; Szabo, Gabor; Cavallaro, Joseph R.; Smayling, Michael C.; Tittel, Frank K.; Wilson, William L. (1996-03-01)
    Details of an experimental demonstration of a contact hole imaging system are reported in which the depth of focus is increased by a factor of about 3.5 using annular illumination. Due to spatial filtering and nonlinearity ...
  • An Integrated CAD Framework Linking VLSI Layout Editors and Process Simulators 

    Sengupta, Chaitali; Erdelyi, Miklos; Bor, Zsolt; Cavallaro, Joseph R.; Smayling, Michael C.; Szabo, Gabor; Tittel, Frank K.; Wilson, William L. (1996-03-01)
    As feature sizes in VLSI circuits extend into the far sub-micron range, new process techniques, such as using phase shifting masks for photolithography, will be needed. Under these conditions, the only means for the circuit ...
  • Enhanced Microlithography Using Combined Phase Shifting and Off-axis Illumination 

    Erdelyi, Miklos; Bor, Zsolt; Cavallaro, Joseph R.; Szabo, Gabor; Wilson, William L.; Sengupta, Chaitali; Smayling, Michael C.; Tittel, Frank K. (1995-12-01)
    Off-axis illumination is a promising optical microlithography technique which can be used to improve the image quality of line-space patterns. With this method the image is produced by the zero and first order diffracted ...
  • Submicron Optical Lithography Based on a New Interferometric Phase Shifting Technique 

    Kido, Motoi; Szabo, Gabor; Cavallaro, Joseph R.; Wilson, William L.; Smayling, Michael C.; Tittel, Frank K. (1995-08-01)
    This paper reports the computer simulation and experimental demonstration of a new phase shifting technique based on interferometry that is especially suited for deep ultraviolet (UV) microlithography. Significant resolution ...
  • Ultrahigh Resolution Lithography with Excimer Lasers 

    Tittel, Frank K.; Erdelyi, Miklos; Sengupta, Chaitali; Bor, Zsolt; Szabo, Gabor; Cavallaro, Joseph R.; Smayling, Michael C.; Wilson, William L. (1995-07-01)
    The photolithography process is central to integrated circuit fabrication. Through this process an integrated circuit is patterned by imaging a photomask onto a layer of photoresist. The light source currently being used ...
  • A New Interferometric Phase-Shifting Technique for Sub-half-micron Laser Microlithography 

    Erdelyi, Miklos; Sengupta, Chaitali; Bor, Zsolt; Cavallaro, Joseph R.; Kido, Motoi; Smayling, Michael C.; Tittel, Frank K.; Wilson, William L.; Szabo, Gabor (1995-02-01)
    This paper reports recent progress in achieving sub-half-micron feature sizes with UV laser illumination based on a novel interferometric phase shifting (IPS) technique. In the IPS arrangement, the intensity and amount of ...
  • Interferometric Phase Shift Technique for High Resolution Deep UV Microlithography 

    Tittel, Frank K.; Cavallaro, Joseph R.; Kido, Motoi; Smayling, Michael C.; Szabo, Gabor; Wilson, William L. (1994-09-01)
    A new phase shifting technique based on interferometry has been developed which is especially suited for deep-UV microlithography. Using only a single layer chromium mask, with no additional phase shift elements, significant ...
  • Enhanced VLSI Manufacturability Using an Integrated CAD Framework 

    Fossati, Humberto M.; Tittel, Frank K.; Wilson, William L.; Cavallaro, Joseph R. (1994-01-01)
    Continued improvements in VLSI performance, circuit density and production costs are possible, in part, do to significant advances in lithography. As feature sizes get smaller, design houses are faced with either improving ...
  • A New Phase Shifting Method for High Resolution Microlithography 

    Kido, Motoi; Cavallaro, Joseph R.; Szabo, Gabor; Wilson, William L.; Tittel, Frank K. (1994-01-01)
    One of the most promising lithographic technique for the future designs of DRAMs is the phase-shifting mask technique. Conventional phase shifting-masks, however, are difficult to fabricate as they require regions of ...