Now showing items 1-11 of 11

  • On Multipath Channel Estimation for CDMA Systems Using Multiple Sensors 

    Sengupta, Chaitali; Cavallaro, Joseph R.; Aazhang, Behnaam (2001-03-20)
    This paper focuses on the design of a multiuser receiver structure for the reverse link of a code-division multiple-access communication system, in the presence of multipath effects and using an antenna array at the base ...
  • Arithmetic Acceleration Techniques for Wireless Communication Receivers 

    Das, Suman; Rajagopal, Sridhar; Sengupta, Chaitali; Cavallaro, Joseph R. (1999-10-20)
    We develop techniques to accelerate the implementation of the next generation wireless communication algorithms in hardware. We discuss an implementation of a key computationally intensive baseband algorithm for joint ...
  • Maximum Likelihood Multipath Channel Parameter Estimation in CDMA Systems 

    Sengupta, Chaitali; Hottinen, Ari; Cavallaro, Joseph R.; Aazhang, Behnaam (1998-03-01)
    The problem addressed in this paper is the estimation of the channel parameters in a Code Division Multiple Access(CDMA) communication system, in the presence of multipath effects. Maximum likelihood estimation of these ...
  • Automated Evaluation of Critical Features in VLSI Layouts Based on Photolithographic Simulations 

    Sengupta, Chaitali; Cavallaro, Joseph R.; Wilson, William L.; Tittel, Frank K. (1997-11-01)
    In this paper, we address the problem of identifying and evaluating “critical features” in an integrated circuit (IC) layout. The “critical features” (e.g., nested elbows and open ends) are areas in the layout that are ...
  • An Integrated CAD Framework Linking VLSI Layout Editors and Process Simulators 

    Sengupta, Chaitali; Erdelyi, Miklos; Bor, Zsolt; Cavallaro, Joseph R.; Smayling, Michael C.; Szabo, Gabor; Tittel, Frank K.; Wilson, William L. (1996-03-01)
    As feature sizes in VLSI circuits extend into the far sub-micron range, new process techniques, such as using phase shifting masks for photolithography, will be needed. Under these conditions, the only means for the circuit ...
  • Automated Evaluation of Critical Features in VLSI Layouts Based on Photolithographic Simulations 

    Cavallaro, Joseph R.; Sengupta, Chaitali; Tittel, Frank K.; Wilson, William L. Jr. (1996-01-01)
    This paper describes a CAD tool (An Integrated CAD Framework) which links VLSI layout editors to lithographic simulators and provides information on the simulated resolution of a feature to the circuit designer. The designer ...
  • Enhanced Microlithography Using Combined Phase Shifting and Off-axis Illumination 

    Erdelyi, Miklos; Bor, Zsolt; Cavallaro, Joseph R.; Szabo, Gabor; Wilson, William L.; Sengupta, Chaitali; Smayling, Michael C.; Tittel, Frank K. (1995-12-01)
    Off-axis illumination is a promising optical microlithography technique which can be used to improve the image quality of line-space patterns. With this method the image is produced by the zero and first order diffracted ...
  • Ultrahigh Resolution Lithography with Excimer Lasers 

    Tittel, Frank K.; Erdelyi, Miklos; Sengupta, Chaitali; Bor, Zsolt; Szabo, Gabor; Cavallaro, Joseph R.; Smayling, Michael C.; Wilson, William L. (1995-07-01)
    The photolithography process is central to integrated circuit fabrication. Through this process an integrated circuit is patterned by imaging a photomask onto a layer of photoresist. The light source currently being used ...
  • An Integrated CAD Framework Linking VLSI Layout Editors and Process Simulators 

    Sengupta, Chaitali (1995-05-20)
    This thesis presents an Integrated CAD Framework which links VLSI layout editors to lithographic simulators and provides information on the simulated resolution of a feature to the circuit designer. This will help designers ...
  • A New Phase Shifting Technique for Deep UV Excimer Laser Based Lithography 

    Bor, Zsolt; Cavallaro, Joseph R.; Erdelyi, Miklos; Kido, Motoi; Sengupta, Chaitali; Smayling, Michael; Szabo, Gabor; Tittel, Frank; Wilson, William (1995-02-01)
    This paper reports simulation and experimental details of a novel phase shifting technique based o laser interferometry. Phase shifting is one of the most promising techniques for the fabrication of high density DRAM's. ...
  • A New Interferometric Phase-Shifting Technique for Sub-half-micron Laser Microlithography 

    Erdelyi, Miklos; Sengupta, Chaitali; Bor, Zsolt; Cavallaro, Joseph R.; Kido, Motoi; Smayling, Michael C.; Tittel, Frank K.; Wilson, William L.; Szabo, Gabor (1995-02-01)
    This paper reports recent progress in achieving sub-half-micron feature sizes with UV laser illumination based on a novel interferometric phase shifting (IPS) technique. In the IPS arrangement, the intensity and amount of ...