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  • Interferometric Phase Shift Technique for High Resolution Deep UV Microlithography 

    Tittel, Frank K.; Cavallaro, Joseph R.; Kido, Motoi; Smayling, Michael C.; Szabo, Gabor; Wilson, William L. (SPIE, 1994-09-01)
    A new phase shifting technique based on interferometry has been developed which is especially suited for deep-UV microlithography. Using only a single layer chromium mask, with no additional phase shift elements, significant ...