Now showing items 1-6 of 6

  • Sub-quarter micron contact hole fabrication using annular illumination 

    Erdelyi, Miklos; Bor, Zsolt; Szabo, Gabor; Cavallaro, Joseph R.; Smayling, Michael C.; Tittel, Frank K.; Wilson, William L. (SPIE, 1996-03-01)
    Details of an experimental demonstration of a contact hole imaging system are reported in which the depth of focus is increased by a factor of about 3.5 using annular illumination. Due to spatial filtering and nonlinearity ...
  • An Integrated CAD Framework Linking VLSI Layout Editors and Process Simulators 

    Sengupta, Chaitali; Erdelyi, Miklos; Bor, Zsolt; Cavallaro, Joseph R.; Smayling, Michael C.; Szabo, Gabor; Tittel, Frank K.; Wilson, William L. (SPIE, 1996-03-01)
    As feature sizes in VLSI circuits extend into the far sub-micron range, new process techniques, such as using phase shifting masks for photolithography, will be needed. Under these conditions, the only means for the circuit ...
  • Enhanced Microlithography Using Combined Phase Shifting and Off-axis Illumination 

    Erdelyi, Miklos; Bor, Zsolt; Cavallaro, Joseph R.; Szabo, Gabor; Wilson, William L.; Sengupta, Chaitali; Smayling, Michael C.; Tittel, Frank K. (Japanese Journal of Applied Physics, 1995-12-01)
    Off-axis illumination is a promising optical microlithography technique which can be used to improve the image quality of line-space patterns. With this method the image is produced by the zero and first order diffracted ...
  • Ultrahigh Resolution Lithography with Excimer Lasers 

    Tittel, Frank K.; Erdelyi, Miklos; Sengupta, Chaitali; Bor, Zsolt; Szabo, Gabor; Cavallaro, Joseph R.; Smayling, Michael C.; Wilson, William L. (Kluwer Academic Publishers, 1995-07-01)
    The photolithography process is central to integrated circuit fabrication. Through this process an integrated circuit is patterned by imaging a photomask onto a layer of photoresist. The light source currently being used ...
  • A New Phase Shifting Technique for Deep UV Excimer Laser Based Lithography 

    Bor, Zsolt; Cavallaro, Joseph R.; Erdelyi, Miklos; Kido, Motoi; Sengupta, Chaitali; Smayling, Michael; Szabo, Gabor; Tittel, Frank; Wilson, William (SPIE, 1995-02-01)
    This paper reports simulation and experimental details of a novel phase shifting technique based o laser interferometry. Phase shifting is one of the most promising techniques for the fabrication of high density DRAM's. ...
  • A New Interferometric Phase-Shifting Technique for Sub-half-micron Laser Microlithography 

    Erdelyi, Miklos; Sengupta, Chaitali; Bor, Zsolt; Cavallaro, Joseph R.; Kido, Motoi; Smayling, Michael C.; Tittel, Frank K.; Wilson, William L.; Szabo, Gabor (SPIE, 1995-02-01)
    This paper reports recent progress in achieving sub-half-micron feature sizes with UV laser illumination based on a novel interferometric phase shifting (IPS) technique. In the IPS arrangement, the intensity and amount of ...