Now showing items 1-3 of 3

    • Automated Evaluation of Critical Features in VLSI Layouts Based on Photolithographic Simulations 

      Sengupta, Chaitali; Cavallaro, Joseph R.; Wilson, William L.; Tittel, Frank K. (1997-11-01)
      In this paper, we address the problem of identifying and evaluating “critical features” in an integrated circuit (IC) layout. The “critical features” (e.g., nested elbows and open ends) are areas in the layout that are ...
    • A New Phase Shifting Technique for Deep UV Excimer Laser Based Lithography 

      Bor, Zsolt; Cavallaro, Joseph R.; Erdelyi, Miklos; Kido, Motoi; Sengupta, Chaitali; Smayling, Michael; Szabo, Gabor; Tittel, Frank; Wilson, William (1995-02-01)
      This paper reports simulation and experimental details of a novel phase shifting technique based o laser interferometry. Phase shifting is one of the most promising techniques for the fabrication of high density DRAM's. ...
    • Ultrahigh Resolution Lithography with Excimer Lasers 

      Tittel, Frank K.; Erdelyi, Miklos; Sengupta, Chaitali; Bor, Zsolt; Szabo, Gabor; Cavallaro, Joseph R.; Smayling, Michael C.; Wilson, William L. (1995-07-01)
      The photolithography process is central to integrated circuit fabrication. Through this process an integrated circuit is patterned by imaging a photomask onto a layer of photoresist. The light source currently being used ...