Now showing items 1-4 of 4

    • Enhanced Microlithography Using Combined Phase Shifting and Off-axis Illumination 

      Erdelyi, Miklos; Bor, Zsolt; Cavallaro, Joseph R.; Szabo, Gabor; Wilson, William L.; Sengupta, Chaitali; Smayling, Michael C.; Tittel, Frank K. (1995-12-01)
      Off-axis illumination is a promising optical microlithography technique which can be used to improve the image quality of line-space patterns. With this method the image is produced by the zero and first order diffracted ...
    • A New Phase Shifting Method for High Resolution Microlithography 

      Kido, Motoi; Cavallaro, Joseph R.; Szabo, Gabor; Wilson, William L.; Tittel, Frank K. (1994-01-01)
      One of the most promising lithographic technique for the future designs of DRAMs is the phase-shifting mask technique. Conventional phase shifting-masks, however, are difficult to fabricate as they require regions of ...
    • A New Phase Shifting Technique for Deep UV Excimer Laser Based Lithography 

      Bor, Zsolt; Cavallaro, Joseph R.; Erdelyi, Miklos; Kido, Motoi; Sengupta, Chaitali; Smayling, Michael; Szabo, Gabor; Tittel, Frank; Wilson, William (1995-02-01)
      This paper reports simulation and experimental details of a novel phase shifting technique based o laser interferometry. Phase shifting is one of the most promising techniques for the fabrication of high density DRAM's. ...
    • Submicron Optical Lithography Based on a New Interferometric Phase Shifting Technique 

      Kido, Motoi; Szabo, Gabor; Cavallaro, Joseph R.; Wilson, William L.; Smayling, Michael C.; Tittel, Frank K. (1995-08-01)
      This paper reports the computer simulation and experimental demonstration of a new phase shifting technique based on interferometry that is especially suited for deep ultraviolet (UV) microlithography. Significant resolution ...