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    • Meniscus-Mask Lithography for Fabrication of Narrow Nanowires 

      Abramova, Vera; Slesarev, Alexander S.; Tour, James M. (2015)
      We demonstrate the efficiency of meniscus-mask lithography (MML) for fabrication of precisely positioned nanowires in a variety of materials. Si, SiO2, Au, Cr, W, Ti, TiO2, and Al nanowires are fabricated and characterized. ...