Now showing items 1-5 of 5

  • Submicron Optical Lithography Based on a New Interferometric Phase Shifting Technique 

    Kido, Motoi; Szabo, Gabor; Cavallaro, Joseph R.; Wilson, William L.; Smayling, Michael C.; Tittel, Frank K. (1995-08-01)
    This paper reports the computer simulation and experimental demonstration of a new phase shifting technique based on interferometry that is especially suited for deep ultraviolet (UV) microlithography. Significant resolution ...
  • A New Phase Shifting Technique for Deep UV Excimer Laser Based Lithography 

    Bor, Zsolt; Cavallaro, Joseph R.; Erdelyi, Miklos; Kido, Motoi; Sengupta, Chaitali; Smayling, Michael; Szabo, Gabor; Tittel, Frank; Wilson, William (1995-02-01)
    This paper reports simulation and experimental details of a novel phase shifting technique based o laser interferometry. Phase shifting is one of the most promising techniques for the fabrication of high density DRAM's. ...
  • A New Interferometric Phase-Shifting Technique for Sub-half-micron Laser Microlithography 

    Erdelyi, Miklos; Sengupta, Chaitali; Bor, Zsolt; Cavallaro, Joseph R.; Kido, Motoi; Smayling, Michael C.; Tittel, Frank K.; Wilson, William L.; Szabo, Gabor (1995-02-01)
    This paper reports recent progress in achieving sub-half-micron feature sizes with UV laser illumination based on a novel interferometric phase shifting (IPS) technique. In the IPS arrangement, the intensity and amount of ...
  • Interferometric Phase Shift Technique for High Resolution Deep UV Microlithography 

    Tittel, Frank K.; Cavallaro, Joseph R.; Kido, Motoi; Smayling, Michael C.; Szabo, Gabor; Wilson, William L. (1994-09-01)
    A new phase shifting technique based on interferometry has been developed which is especially suited for deep-UV microlithography. Using only a single layer chromium mask, with no additional phase shift elements, significant ...
  • A New Phase Shifting Method for High Resolution Microlithography 

    Kido, Motoi; Cavallaro, Joseph R.; Szabo, Gabor; Wilson, William L.; Tittel, Frank K. (1994-01-01)
    One of the most promising lithographic technique for the future designs of DRAMs is the phase-shifting mask technique. Conventional phase shifting-masks, however, are difficult to fabricate as they require regions of ...