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Title:
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Ultrahigh Resolution Lithography with Excimer Lasers |
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Author:
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Tittel, Frank K.; Erdelyi, Miklos; Sengupta, Chaitali; Bor, Zsolt; Szabo, Gabor; Cavallaro, Joseph R.; Smayling, Michael C.; Wilson, William L.
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Type:
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Conference Paper |
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Publisher:
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Kluwer Academic Publishers |
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Citation:
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F. K. Tittel, M. Erdelyi, C. Sengupta, Z. Bor, G. Szabo, J. R. Cavallaro, M. C. Smayling and W. L. Wilson,"Ultrahigh Resolution Lithography with Excimer Lasers," in NATO Workshop on Gas Lasers - Recent Developments and Future Prospects, 1995, pp. 263-272. |
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Abstract:
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The photolithography process is central to integrated circuit fabrication. Through this process an integrated circuit is patterned by imaging a photomask onto a layer of photoresist. The light source currently being used by the semiconductor industry in the photolithography process for 0.35 micron feature size is the mercury lamp. As the feature size for integrated circuits moves below 0.35 microns, a new source of shorter wavelength light and higher power must be found to replace the mercury lamp. |
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Date Published:
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1995-07-01 |
