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Title:
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Interferometric Phase Shift Technique for High Resolution Deep UV Microlithography |
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Author:
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Tittel, Frank K.; Cavallaro, Joseph R.; Kido, Motoi; Smayling, Michael C.; Szabo, Gabor; Wilson, William L.
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Type:
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Conference Paper |
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Publisher:
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SPIE |
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Citation:
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F. K. Tittel, J. R. Cavallaro, M. Kido, M. C. Smayling, G. Szabo and W. L. Wilson,"Interferometric Phase Shift Technique for High Resolution Deep UV Microlithography," in Tenth International Symposium on Gas Flow and Chemical Lasers, 1994, pp. 617-624. |
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Abstract:
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A new phase shifting technique based on interferometry has been developed which is especially suited for deep-UV microlithography. Using only a single layer chromium mask, with no additional phase shift elements, significant resolution and contrast enhancement over conventional transmission lithography can be achieved. Both computer simulations, as well as experiments using a CCD camera and UV photoresist confirm the capabilities of this new approach. Using a relatively simple experimental setup and an illumination wavelength of 355 nm, lines with feature sizes as find as 0.3 um were achieved. |
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Date Published:
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1994-09-01 |
