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Title:
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A New Phase Shifting Method for High Resolution Microlithography |
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Author:
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Kido, Motoi; Cavallaro, Joseph R.; Szabo, Gabor; Wilson, William L.; Tittel, Frank K.
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Type:
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Conference Paper |
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Publisher:
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SME Press |
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Citation:
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M. Kido, J. R. Cavallaro, G. Szabo, W. L. Wilson and F. K. Tittel,"A New Phase Shifting Method for High Resolution Microlithography," in NSF Design and Manufacturing Grantees Conference, 1994, pp. 577-578. |
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Abstract:
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One of the most promising lithographic technique for the future designs of DRAMs is the phase-shifting mask technique. Conventional phase shifting-masks, however, are difficult to fabricate as they require regions of different optical thickness. We present a new phase shifting technique that does not use any phase shifting materials. A special interferometer and a mask that has both transmitting areas and reflective areas accomplish the required phase-shift at the image plane. Using this technique we have demonstrated phase shifting effects using a CCD camera. We also present the results of a computer simulation for the critical resolution of this new method in comparison with the conventional phase shifting approach. |
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Date Published:
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1994-01-01 |
