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A New Phase Shifting Method for High Resolution Microlithography

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Title: A New Phase Shifting Method for High Resolution Microlithography
Author: Kido, Motoi; Cavallaro, Joseph R.; Szabo, Gabor; Wilson, William L.; Tittel, Frank K.
Type: Conference Paper
Publisher: SME Press
Citation: M. Kido, J. R. Cavallaro, G. Szabo, W. L. Wilson and F. K. Tittel,"A New Phase Shifting Method for High Resolution Microlithography," in NSF Design and Manufacturing Grantees Conference, 1994, pp. 577-578.
Abstract: One of the most promising lithographic technique for the future designs of DRAMs is the phase-shifting mask technique. Conventional phase shifting-masks, however, are difficult to fabricate as they require regions of different optical thickness. We present a new phase shifting technique that does not use any phase shifting materials. A special interferometer and a mask that has both transmitting areas and reflective areas accomplish the required phase-shift at the image plane. Using this technique we have demonstrated phase shifting effects using a CCD camera. We also present the results of a computer simulation for the critical resolution of this new method in comparison with the conventional phase shifting approach.
Date Published: 1994-01-01

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  • ECE Publications [1034 items]
    Publications by Rice University Electrical and Computer Engineering faculty and graduate students
  • CMC Publications [275 items]
    Publications by Rice Faculty and graduate students in multimedia communications