Browse the entire archive

Browsing CMC Publications by Author "Wilson, William L. Jr."

Automated Evaluation of Critical Features in VLSI Layouts Based on Photolithographic Simulations

J. R. Cavallaro, C. Sengupta, F. K. Tittel and W. L. J. Wilson,"Automated Evaluation of Critical Features in VLSI Layouts Based on Photolithographic Simulations," in NSF Design and Manufacturing Grantees Conference, 1996, pp. 345-346.
Submicron Optical Lithography Based on Interferometric Phase Shifting

J. R. Cavallaro, F. K. Tittel and W. L. J. Wilson,"Submicron Optical Lithography Based on Interferometric Phase Shifting," in NSF Design, Manufacturing and Industrial Innovation Grantees Conference, 1995, pp. 395-396.