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C. Sengupta, J. R. Cavallaro and B. Aazhang, "On Multipath Channel Estimation for CDMA Systems Using Multiple Sensors," IEEE Transactions on Communications, vol. 49, no. 3, pp. 543-553, 2001.
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S. Das, S. Rajagopal, C. Sengupta and J. R. Cavallaro,"Arithmetic Acceleration Techniques for Wireless Communication Receivers," in Asilomar Conference on Signals, Systems, and Computers,, pp. 1469 - 1474.
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C. Sengupta, A. Hottinen, J. R. Cavallaro and B. Aazhang,"Maximum Likelihood Multipath Channel Parameter Estimation in CDMA Systems," in Conference on Information Sciences and Systems, 1998
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C. Sengupta, J. R. Cavallaro, W. L. Wilson and F. K. Tittel, "Automated Evaluation of Critical Features in VLSI Layouts Based on Photolithographic Simulations," IEEE Transactions on Semiconductor Manufacturing, vol. 10, no. 4, pp. 482-494, 1997.
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C. Sengupta, M. Erdelyi, Z. Bor, J. R. Cavallaro, M. C. Smayling, G. Szabo, F. K. Tittel and W. L. Wilson,"An Integrated CAD Framework Linking VLSI Layout Editors and Process Simulators," in SPIE Conference on Optical Microlithography IX, 1996, pp. 244-252.
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J. R. Cavallaro, C. Sengupta, F. K. Tittel and W. L. J. Wilson,"Automated Evaluation of Critical Features in VLSI Layouts Based on Photolithographic Simulations," in NSF Design and Manufacturing Grantees Conference, 1996, pp. 345-346.
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M. Erdelyi, Z. Bor, J. R. Cavallaro, G. Szabo, W. L. Wilson, C. Sengupta, M. C. Smayling and F. K. Tittel, "Enhanced Microlithography Using Combined Phase Shifting and Off-axis Illumination," Japanese Journal of Applied Physics, vol. 34, no. 12A, pp. L1629-L1631, 1995.
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F. K. Tittel, M. Erdelyi, C. Sengupta, Z. Bor, G. Szabo, J. R. Cavallaro, M. C. Smayling and W. L. Wilson,"Ultrahigh Resolution Lithography with Excimer Lasers," in NATO Workshop on Gas Lasers - Recent Developments and Future Prospects, 1995, pp. 263-272.
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C. Sengupta, "An Integrated CAD Framework Linking VLSI Layout Editors and Process Simulators," Masters Thesis, pp. 102, 1995.
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M. Erdelyi, C. Sengupta, Z. Bor, J. R. Cavallaro, M. Kido, M. C. Smayling, F. K. Tittel, W. L. Wilson and G. Szabo,"A New Interferometric Phase-Shifting Technique for Sub-half-micron Laser Microlithography," in SPIE Conference on Optical/Laser Microlithography VIII, 1995, pp. 827-837.
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Z. Bor, J. R. Cavallaro, M. Erdelyi, M. Kido, C. Sengupta, M. Smayling, G. Szabo, F. Tittel and W. Wilson,"A New Phase Shifting Technique for Deep UV Excimer Laser Based Lithography," in SPIE Conference on Photonics West, 1995, pp. 195-202.