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M. Erdelyi, C. Sengupta, Z. Bor, J. R. Cavallaro, M. Kido, M. C. Smayling, F. K. Tittel, W. L. Wilson and G. Szabo,"A New Interferometric Phase-Shifting Technique for Sub-half-micron Laser Microlithography," in SPIE Conference on Optical/Laser Microlithography VIII, 1995, pp. 827-837.