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M. Erdelyi, Z. Bor, J. R. Cavallaro, G. Szabo, W. L. Wilson, C. Sengupta, M. C. Smayling and F. K. Tittel, "Enhanced Microlithography Using Combined Phase Shifting and Off-axis Illumination," Japanese Journal of Applied Physics, vol. 34, no. 12A, pp. L1629-L1631, 1995.
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M. Erdelyi, C. Sengupta, Z. Bor, J. R. Cavallaro, M. Kido, M. C. Smayling, F. K. Tittel, W. L. Wilson and G. Szabo,"A New Interferometric Phase-Shifting Technique for Sub-half-micron Laser Microlithography," in SPIE Conference on Optical/Laser Microlithography VIII, 1995, pp. 827-837.
M. Erdelyi, Z. Bor, J. R. Cavallaro, G. Szabo, W. L. Wilson, C. Sengupta, M. C. Smayling and F. K. Tittel, "Enhanced Microlithography Using Combined Phase Shifting and Off-axis Illumination," Japanese Journal of Applied Physics, vol. 34, no. 12A, pp. L1629-L1631, 1995.
M. Erdelyi, C. Sengupta, Z. Bor, J. R. Cavallaro, M. Kido, M. C. Smayling, F. K. Tittel, W. L. Wilson and G. Szabo,"A New Interferometric Phase-Shifting Technique for Sub-half-micron Laser Microlithography," in SPIE Conference on Optical/Laser Microlithography VIII, 1995, pp. 827-837.