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M. Erdelyi, Z. L. Horvath, G. Szabo, Z. Bor, F. K. Tittel, J. R. Cavallaro and M. C. Smayling, "Generation of diffraction-free beams for applications in optical microlithography," Journal of Vacuum Science and Technology B, vol. 15, no. 2, pp. 287-292, 1997.
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F. K. Tittel, J. R. Cavallaro, M. Kido, M. C. Smayling, G. Szabo and W. L. Wilson,"Interferometric Phase Shift Technique for High Resolution Deep UV Microlithography," in Tenth International Symposium on Gas Flow and Chemical Lasers, 1994, pp. 617-624.
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M. Erdelyi, C. Sengupta, Z. Bor, J. R. Cavallaro, M. Kido, M. C. Smayling, F. K. Tittel, W. L. Wilson and G. Szabo,"A New Interferometric Phase-Shifting Technique for Sub-half-micron Laser Microlithography," in SPIE Conference on Optical/Laser Microlithography VIII, 1995, pp. 827-837.
M. Erdelyi, Z. L. Horvath, G. Szabo, Z. Bor, F. K. Tittel, J. R. Cavallaro and M. C. Smayling, "Generation of diffraction-free beams for applications in optical microlithography," Journal of Vacuum Science and Technology B, vol. 15, no. 2, pp. 287-292, 1997.
F. K. Tittel, J. R. Cavallaro, M. Kido, M. C. Smayling, G. Szabo and W. L. Wilson,"Interferometric Phase Shift Technique for High Resolution Deep UV Microlithography," in Tenth International Symposium on Gas Flow and Chemical Lasers, 1994, pp. 617-624.
M. Erdelyi, C. Sengupta, Z. Bor, J. R. Cavallaro, M. Kido, M. C. Smayling, F. K. Tittel, W. L. Wilson and G. Szabo,"A New Interferometric Phase-Shifting Technique for Sub-half-micron Laser Microlithography," in SPIE Conference on Optical/Laser Microlithography VIII, 1995, pp. 827-837.