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Browsing CMC Publications by Subject "Circuit design"

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Automated Evaluation of Critical Features in VLSI Layouts Based on Photolithographic Simulations

J. R. Cavallaro, C. Sengupta, F. K. Tittel and W. L. J. Wilson,"Automated Evaluation of Critical Features in VLSI Layouts Based on Photolithographic Simulations," in NSF Design and Manufacturing Grantees Conference, 1996, pp. 345-346.