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J. R. Cavallaro, C. Sengupta, F. K. Tittel and W. L. J. Wilson,"Automated Evaluation of Critical Features in VLSI Layouts Based on Photolithographic Simulations," in NSF Design and Manufacturing Grantees Conference, 1996, pp. 345-346.
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C. Sengupta, M. Erdelyi, Z. Bor, J. R. Cavallaro, M. C. Smayling, G. Szabo, F. K. Tittel and W. L. Wilson,"An Integrated CAD Framework Linking VLSI Layout Editors and Process Simulators," in SPIE Conference on Optical Microlithography IX, 1996, pp. 244-252.
J. R. Cavallaro, C. Sengupta, F. K. Tittel and W. L. J. Wilson,"Automated Evaluation of Critical Features in VLSI Layouts Based on Photolithographic Simulations," in NSF Design and Manufacturing Grantees Conference, 1996, pp. 345-346.
C. Sengupta, M. Erdelyi, Z. Bor, J. R. Cavallaro, M. C. Smayling, G. Szabo, F. K. Tittel and W. L. Wilson,"An Integrated CAD Framework Linking VLSI Layout Editors and Process Simulators," in SPIE Conference on Optical Microlithography IX, 1996, pp. 244-252.