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Title:
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Physical characterization of lithium niobate thin films on silicon substrates |
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Author:
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Stone, Barbara Ann |
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Advisor:
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Rabson, Thomas A. |
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Abstract:
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The structure and orientation of radio frequency sputtered lithium niobate (LiNbO$\sb3$) films on silicon substrates is determined using x-ray diffraction. The structure of the LiNbO$\sb3$ films is determined to be a strong function of the substrate temperature. The preferred crystal orientation of the film is found to depend on the substrate orientation. Of particular importance is the observation of LiNbO$\sb3$ polycrystalline films oriented with the c axis of the crystallites normal to the surface of $\langle$111$\rangle$ silicon substrates. This result is important since the ferroelectric polarization and photocurrents are directed along the c axis of crystal, making the development of ferroelectric memory devices using LiNbO$\sb3$ possible. Scanning electron microscopy revealed that the films were generally smooth, and no ferroelectric domain contrast was observed. Ellipsometry was used to determine the refractive indices and thicknesses of the films. |
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Citation:
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Stone, Barbara Ann. "Physical characterization of lithium niobate thin films on silicon substrates." Masters Thesis, Rice University, ETD http://hdl.handle.net/1911/13320. |
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Citable link to this page:
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http://hdl.handle.net/1911/13320 |
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Date:
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1988 |
