Browse this collection by:
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S. So, G. Wysocki, P. Frantz and F. K. Tittel, "Development of Digital Signal Processor controlled Quantum Cascade Laser based Trace Gas Sensor Technology," IEEE Sensors, 2006.
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G. Wysocki, S. So, M. McCurdy, C. Roller, D. Weidman, P. Frantz, R. Curl and F. K. Tittel,"Quantum Cascade Laser Spectrometer for Trace-Gas Detection of Exhaled Carbonyl Sulfide," in Conference on Lasers and Electro-Optics,, pp. 759-759.
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Z. L. Horvath, M. Erdelyi, G. Szabo, Z. Bor, F. K. Tittel and J. R. Cavallaro, "Generation of nearly nondiffracting Bessel beams with a Fabry–Perot interferometer," Journal of the Optical Society of America A, vol. 14, no. 11, pp. 3009-3013, 1997.
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C. Sengupta, J. R. Cavallaro, W. L. Wilson and F. K. Tittel, "Automated Evaluation of Critical Features in VLSI Layouts Based on Photolithographic Simulations," IEEE Transactions on Semiconductor Manufacturing, vol. 10, no. 4, pp. 482-494, 1997.
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M. Erdelyi, Z. L. Horvath, G. Szabo, Z. Bor, F. K. Tittel, J. R. Cavallaro and M. C. Smayling, "Generation of diffraction-free beams for applications in optical microlithography," Journal of Vacuum Science and Technology B, vol. 15, no. 2, pp. 287-292, 1997.
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M. Erdelyi, Z. Bor, G. Szabo, J. R. Cavallaro, M. C. Smayling, F. K. Tittel and W. L. Wilson,"Sub-quarter micron contact hole fabrication using annular illumination," in SPIE Conference on Optical Microlithography IX, 1996, pp. 88-93.
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C. Sengupta, M. Erdelyi, Z. Bor, J. R. Cavallaro, M. C. Smayling, G. Szabo, F. K. Tittel and W. L. Wilson,"An Integrated CAD Framework Linking VLSI Layout Editors and Process Simulators," in SPIE Conference on Optical Microlithography IX, 1996, pp. 244-252.
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J. R. Cavallaro, C. Sengupta, F. K. Tittel and W. L. J. Wilson,"Automated Evaluation of Critical Features in VLSI Layouts Based on Photolithographic Simulations," in NSF Design and Manufacturing Grantees Conference, 1996, pp. 345-346.
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M. Erdelyi, Z. Bor, J. R. Cavallaro, G. Szabo, W. L. Wilson, C. Sengupta, M. C. Smayling and F. K. Tittel, "Enhanced Microlithography Using Combined Phase Shifting and Off-axis Illumination," Japanese Journal of Applied Physics, vol. 34, no. 12A, pp. L1629-L1631, 1995.
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M. Kido, G. Szabo, J. R. Cavallaro, W. L. Wilson, M. C. Smayling and F. K. Tittel, "Submicron Optical Lithography Based on a New Interferometric Phase Shifting Technique," Japanese Journal of Applied Physics, vol. 34, no. 8A, pp. 4269-4273, 1995.
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F. K. Tittel, M. Erdelyi, C. Sengupta, Z. Bor, G. Szabo, J. R. Cavallaro, M. C. Smayling and W. L. Wilson,"Ultrahigh Resolution Lithography with Excimer Lasers," in NATO Workshop on Gas Lasers - Recent Developments and Future Prospects, 1995, pp. 263-272.
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M. Erdelyi, C. Sengupta, Z. Bor, J. R. Cavallaro, M. Kido, M. C. Smayling, F. K. Tittel, W. L. Wilson and G. Szabo,"A New Interferometric Phase-Shifting Technique for Sub-half-micron Laser Microlithography," in SPIE Conference on Optical/Laser Microlithography VIII, 1995, pp. 827-837.
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J. R. Cavallaro, F. K. Tittel and W. L. J. Wilson,"Submicron Optical Lithography Based on Interferometric Phase Shifting," in NSF Design, Manufacturing and Industrial Innovation Grantees Conference, 1995, pp. 395-396.
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F. K. Tittel, J. R. Cavallaro, M. Kido, M. C. Smayling, G. Szabo and W. L. Wilson,"Interferometric Phase Shift Technique for High Resolution Deep UV Microlithography," in Tenth International Symposium on Gas Flow and Chemical Lasers, 1994, pp. 617-624.
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H. M. Fossati, F. K. Tittel, W. L. Wilson and J. R. Cavallaro,"Enhanced VLSI Manufacturability Using an Integrated CAD Framework," in NSF Design and Manufacturing Grantees Conference, 1994, pp. 549-550.
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M. Kido, J. R. Cavallaro, G. Szabo, W. L. Wilson and F. K. Tittel,"A New Phase Shifting Method for High Resolution Microlithography," in NSF Design and Manufacturing Grantees Conference, 1994, pp. 577-578.
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C. M. Marshall, C. R. Pollock, R. E. Stickel and F. K. Tittel, "Computer Controlled Intracavity Frequency Doubling of a CW Dye Ring Laser," Rice University ECE Technical Report, no. 7911, 1979.
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D. M. Kim, R. R. Shah, T. A. Rabson and F. K. Tittel, "Study of the Equivalent Electron Drift Field Characteristics in LiNb03 by Phase Holography," Rice University ECE Technical Report, no. 7607, 1976.
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R. R. Shah, D. M. Kim, T. A. Rabson and F. K. Tittel, "Characterization of Iron Doped Lithium Niobate for Holographic Storage Applications," Rice University ECE Technical Report, no. 7606, 1976.
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D. M. Kim, R. R. Shah, T. A. Rabson and F. K. Tittel, "Nonlinear Dynamic Theory for Photorefractive Phase Hologram Formation," Rice University ECE Technical Report, no. 7602, 1976.
S. So, G. Wysocki, P. Frantz and F. K. Tittel, "Development of Digital Signal Processor controlled Quantum Cascade Laser based Trace Gas Sensor Technology," IEEE Sensors, 2006.
G. Wysocki, S. So, M. McCurdy, C. Roller, D. Weidman, P. Frantz, R. Curl and F. K. Tittel,"Quantum Cascade Laser Spectrometer for Trace-Gas Detection of Exhaled Carbonyl Sulfide," in Conference on Lasers and Electro-Optics,, pp. 759-759.
Z. L. Horvath, M. Erdelyi, G. Szabo, Z. Bor, F. K. Tittel and J. R. Cavallaro, "Generation of nearly nondiffracting Bessel beams with a Fabry–Perot interferometer," Journal of the Optical Society of America A, vol. 14, no. 11, pp. 3009-3013, 1997.
C. Sengupta, J. R. Cavallaro, W. L. Wilson and F. K. Tittel, "Automated Evaluation of Critical Features in VLSI Layouts Based on Photolithographic Simulations," IEEE Transactions on Semiconductor Manufacturing, vol. 10, no. 4, pp. 482-494, 1997.
M. Erdelyi, Z. L. Horvath, G. Szabo, Z. Bor, F. K. Tittel, J. R. Cavallaro and M. C. Smayling, "Generation of diffraction-free beams for applications in optical microlithography," Journal of Vacuum Science and Technology B, vol. 15, no. 2, pp. 287-292, 1997.
M. Erdelyi, Z. Bor, G. Szabo, J. R. Cavallaro, M. C. Smayling, F. K. Tittel and W. L. Wilson,"Sub-quarter micron contact hole fabrication using annular illumination," in SPIE Conference on Optical Microlithography IX, 1996, pp. 88-93.
C. Sengupta, M. Erdelyi, Z. Bor, J. R. Cavallaro, M. C. Smayling, G. Szabo, F. K. Tittel and W. L. Wilson,"An Integrated CAD Framework Linking VLSI Layout Editors and Process Simulators," in SPIE Conference on Optical Microlithography IX, 1996, pp. 244-252.
J. R. Cavallaro, C. Sengupta, F. K. Tittel and W. L. J. Wilson,"Automated Evaluation of Critical Features in VLSI Layouts Based on Photolithographic Simulations," in NSF Design and Manufacturing Grantees Conference, 1996, pp. 345-346.
M. Erdelyi, Z. Bor, J. R. Cavallaro, G. Szabo, W. L. Wilson, C. Sengupta, M. C. Smayling and F. K. Tittel, "Enhanced Microlithography Using Combined Phase Shifting and Off-axis Illumination," Japanese Journal of Applied Physics, vol. 34, no. 12A, pp. L1629-L1631, 1995.
M. Kido, G. Szabo, J. R. Cavallaro, W. L. Wilson, M. C. Smayling and F. K. Tittel, "Submicron Optical Lithography Based on a New Interferometric Phase Shifting Technique," Japanese Journal of Applied Physics, vol. 34, no. 8A, pp. 4269-4273, 1995.
F. K. Tittel, M. Erdelyi, C. Sengupta, Z. Bor, G. Szabo, J. R. Cavallaro, M. C. Smayling and W. L. Wilson,"Ultrahigh Resolution Lithography with Excimer Lasers," in NATO Workshop on Gas Lasers - Recent Developments and Future Prospects, 1995, pp. 263-272.
M. Erdelyi, C. Sengupta, Z. Bor, J. R. Cavallaro, M. Kido, M. C. Smayling, F. K. Tittel, W. L. Wilson and G. Szabo,"A New Interferometric Phase-Shifting Technique for Sub-half-micron Laser Microlithography," in SPIE Conference on Optical/Laser Microlithography VIII, 1995, pp. 827-837.
J. R. Cavallaro, F. K. Tittel and W. L. J. Wilson,"Submicron Optical Lithography Based on Interferometric Phase Shifting," in NSF Design, Manufacturing and Industrial Innovation Grantees Conference, 1995, pp. 395-396.
F. K. Tittel, J. R. Cavallaro, M. Kido, M. C. Smayling, G. Szabo and W. L. Wilson,"Interferometric Phase Shift Technique for High Resolution Deep UV Microlithography," in Tenth International Symposium on Gas Flow and Chemical Lasers, 1994, pp. 617-624.
H. M. Fossati, F. K. Tittel, W. L. Wilson and J. R. Cavallaro,"Enhanced VLSI Manufacturability Using an Integrated CAD Framework," in NSF Design and Manufacturing Grantees Conference, 1994, pp. 549-550.
M. Kido, J. R. Cavallaro, G. Szabo, W. L. Wilson and F. K. Tittel,"A New Phase Shifting Method for High Resolution Microlithography," in NSF Design and Manufacturing Grantees Conference, 1994, pp. 577-578.
C. M. Marshall, C. R. Pollock, R. E. Stickel and F. K. Tittel, "Computer Controlled Intracavity Frequency Doubling of a CW Dye Ring Laser," Rice University ECE Technical Report, no. 7911, 1979.
D. M. Kim, R. R. Shah, T. A. Rabson and F. K. Tittel, "Study of the Equivalent Electron Drift Field Characteristics in LiNb03 by Phase Holography," Rice University ECE Technical Report, no. 7607, 1976.
R. R. Shah, D. M. Kim, T. A. Rabson and F. K. Tittel, "Characterization of Iron Doped Lithium Niobate for Holographic Storage Applications," Rice University ECE Technical Report, no. 7606, 1976.
D. M. Kim, R. R. Shah, T. A. Rabson and F. K. Tittel, "Nonlinear Dynamic Theory for Photorefractive Phase Hologram Formation," Rice University ECE Technical Report, no. 7602, 1976.