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M. Kido, G. Szabo, J. R. Cavallaro, W. L. Wilson, M. C. Smayling and F. K. Tittel, "Submicron Optical Lithography Based on a New Interferometric Phase Shifting Technique," Japanese Journal of Applied Physics, vol. 34, no. 8A, pp. 4269-4273, 1995.
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M. Erdelyi, C. Sengupta, Z. Bor, J. R. Cavallaro, M. Kido, M. C. Smayling, F. K. Tittel, W. L. Wilson and G. Szabo,"A New Interferometric Phase-Shifting Technique for Sub-half-micron Laser Microlithography," in SPIE Conference on Optical/Laser Microlithography VIII, 1995, pp. 827-837.
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Z. Bor, J. R. Cavallaro, M. Erdelyi, M. Kido, C. Sengupta, M. Smayling, G. Szabo, F. Tittel and W. Wilson,"A New Phase Shifting Technique for Deep UV Excimer Laser Based Lithography," in SPIE Conference on Photonics West, 1995, pp. 195-202.
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F. K. Tittel, J. R. Cavallaro, M. Kido, M. C. Smayling, G. Szabo and W. L. Wilson,"Interferometric Phase Shift Technique for High Resolution Deep UV Microlithography," in Tenth International Symposium on Gas Flow and Chemical Lasers, 1994, pp. 617-624.
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M. Kido, J. R. Cavallaro, G. Szabo, W. L. Wilson and F. K. Tittel,"A New Phase Shifting Method for High Resolution Microlithography," in NSF Design and Manufacturing Grantees Conference, 1994, pp. 577-578.
M. Kido, G. Szabo, J. R. Cavallaro, W. L. Wilson, M. C. Smayling and F. K. Tittel, "Submicron Optical Lithography Based on a New Interferometric Phase Shifting Technique," Japanese Journal of Applied Physics, vol. 34, no. 8A, pp. 4269-4273, 1995.
M. Erdelyi, C. Sengupta, Z. Bor, J. R. Cavallaro, M. Kido, M. C. Smayling, F. K. Tittel, W. L. Wilson and G. Szabo,"A New Interferometric Phase-Shifting Technique for Sub-half-micron Laser Microlithography," in SPIE Conference on Optical/Laser Microlithography VIII, 1995, pp. 827-837.
Z. Bor, J. R. Cavallaro, M. Erdelyi, M. Kido, C. Sengupta, M. Smayling, G. Szabo, F. Tittel and W. Wilson,"A New Phase Shifting Technique for Deep UV Excimer Laser Based Lithography," in SPIE Conference on Photonics West, 1995, pp. 195-202.
F. K. Tittel, J. R. Cavallaro, M. Kido, M. C. Smayling, G. Szabo and W. L. Wilson,"Interferometric Phase Shift Technique for High Resolution Deep UV Microlithography," in Tenth International Symposium on Gas Flow and Chemical Lasers, 1994, pp. 617-624.
M. Kido, J. R. Cavallaro, G. Szabo, W. L. Wilson and F. K. Tittel,"A New Phase Shifting Method for High Resolution Microlithography," in NSF Design and Manufacturing Grantees Conference, 1994, pp. 577-578.